Quartz crucible has the advantages of high purity, high temperature resistance, large size, high precision, good heat preservation, energy saving and stable quality, so it is widely used. The detection of quartz crucible is a very important link, and the detection of quartz crucible is developing towards the direction of field detection!
1. Quartz crucible can be used below 1450 degrees, including transparent and opaque. The translucent quartz crucible made by arc method is an essential basic material for drawing large diameter single crystal silicon and developing large scale integrated circuits. Nowadays, the developed countries of semiconductor industry in the world have replaced the small transparent quartz crucible with this crucible. It has the advantages of high purity, high temperature resistance, large size, high precision, good heat preservation, energy saving and stable quality.
2. It can't contact with HF. At high temperature, it is easy to react with caustic alkali and carbonate of alkali metal.
3. The quartz crucible is suitable for melting samples with K2S2O7 and KHSO4 as fluxes and na2s207 (first dried at 212 ℃) as fluxes.
4. Quartz is brittle and easy to break, so pay attention to it when using.
5. Except HF,
Ordinary dilute inorganic acid can be used as cleaning fluid. Quartz crucibles for drawing monocrystalline silicon are commonly used in China, including 18 inch and 20 inch 22 inch quartz crucibles, and 22 inch and above crucibles are also used by manufacturers. At present, the technology of crucible produced by big crucible manufacturers in China is relatively mature. The raw materials of quartz sand are imported from USA and high purity quartz sand from Norway. There are also small factories using domestic materials. The quartz crucible produced by the raw materials has a certain influence on the stability of monocrystalline silicon.
At present, the crucible production coating technology has been used by most manufacturers, which is to coat a layer of barium dioxide solution on the surface of the crucible made of ordinary quartz sand to form a dense layer. The dense layer can prevent the reaction between silicon and quartz crucible during the high temperature drawing process of monocrystalline silicon and improve the crystallization rate
